Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography | |
Geng C (Geng, Chong) ; Zheng L (Zheng, Lu) ; Yu J (Yu, Jie) ; Yan QF (Yan, Qingfeng) ; Wei TB (Wei, Tongbo) ; Wang XQ (Wang, Xiaoqing) ; Shen DZ (Shen, Dezhong) | |
刊名 | journal of materials chemistry
![]() |
2012 | |
卷号 | 22期号:42页码:22678-22685 |
学科主题 | 光电子学 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-04-02 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/23869] ![]() |
专题 | 半导体研究所_集成光电子学国家重点实验室 |
推荐引用方式 GB/T 7714 | Geng C ,Zheng L ,Yu J ,et al. Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography[J]. journal of materials chemistry,2012,22(42):22678-22685. |
APA | Geng C .,Zheng L .,Yu J .,Yan QF .,Wei TB .,...&Shen DZ .(2012).Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography.journal of materials chemistry,22(42),22678-22685. |
MLA | Geng C ,et al."Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography".journal of materials chemistry 22.42(2012):22678-22685. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论