Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography

	Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
	Geng C (Geng, Chong) ; Zheng L (Zheng, Lu) ; Yu J (Yu, Jie) ; Yan QF (Yan, Qingfeng) ; Wei TB (Wei, Tongbo) ; Wang XQ (Wang, Xiaoqing) ; Shen DZ (Shen, Dezhong)
刊名	journal of materials chemistry
	2012
卷号	22 期号:42 页码:22678-22685
学科主题	光电子学
收录类别	SCI
语种	英语
公开日期	2013-04-02
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/23869]
专题	半导体研究所_集成光电子学国家重点实验室
推荐引用方式 GB/T 7714	Geng C ,Zheng L ,Yu J ,et al. Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography[J]. journal of materials chemistry,2012,22(42):22678-22685.
APA	Geng C .,Zheng L .,Yu J .,Yan QF .,Wei TB .,...&Shen DZ .(2012).Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography.journal of materials chemistry,22(42),22678-22685.
MLA	Geng C ,et al."Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography".journal of materials chemistry 22.42(2012):22678-22685.