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	In situ long trace profiler for measurement of Wolter type-I mirror (EI CONFERENCE)
	Cui T. G. ; Wang Y. G. ; Ma W. S. ; Chen B.
	2010
会议名称	Advances in Metrology for X-Ray and EUV Optics III, August 1, 2010 - August 2, 2010
会议地点	San Diego, CA, United states
关键词	The surface profile of Wolter type-I mirror has a great impact on the performance of Solar X-ray Telescope. According to the existing fabrication instrument and experimental conditions in our lab an in situ Long Trace Profiler is developed and set up on the fabrication instrument in order to measure the surface profile of Wolter mirror in real time during fabrication process. Its working mechanism structural parameters and data processing algorithm are investigated. The prototype calibrated by a standard plane mirror is used to measure a sample of Wolter type-I mirror. The results show that our prototype can achieve an accuracy of 2.6rad rms for slope error with a stability of 1.33rad during the whole measurement period. This can meet further fabrication requirements. 2010 Copyright SPIE - The International Society for Optical Engineering.
收录类别	EI
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/33940]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Cui T. G.,Wang Y. G.,Ma W. S.,et al. In situ long trace profiler for measurement of Wolter type-I mirror (EI CONFERENCE)[C]. 见:Advances in Metrology for X-Ray and EUV Optics III, August 1, 2010 - August 2, 2010. San Diego, CA, United states.

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