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	Annular sub-aperture stitching interferometry for testing of large asphreical surfaces (EI CONFERENCE)
	Wang X.-K. ; Wang L.-H. ; Zheng L.-G. ; Deng W.-J. ; Zhang X.-J.
	2008
会议名称	International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007
会议地点	Beijing, China
关键词	Annular subaperture stitching interferometric technology can test large-aperture and the PV and RMS of residual error of the full aperture phase distribution is 0.027 and 0.0023 high numerical aperture aspheric surfaces with high resolution the relative error of PV and RMS is -0.53% and -0.31% respectively. The results conclude that this splicing model and algorithm are accurate and feasible. So it provides another quantitive measurement for test aspheric surfaces especially for large aperture aspheres besides null-compensation. low cost and high efficiency without auxiliary null optics. In this paper the basic principle and theory of the stitching method are introduced the reasonable mathematical model and effective splicing algorithm are established based on simultaneous least-squares method and Zernike polynomial fitting. The translation errors are eliminated from each subaperture through the synthetical optimization stitching mode it keeps the error from transmitting and accumulating. The numerical simulations have been carried on by this method. As results the surface map of the full aperture after stitching is consistent to the input surface map the difference of PV error and RMS error between them is -0.0074 and -0.00052 ( is 632.8nm) respectively
收录类别	EI
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/33702]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Wang X.-K.,Wang L.-H.,Zheng L.-G.,et al. Annular sub-aperture stitching interferometry for testing of large asphreical surfaces (EI CONFERENCE)[C]. 见:International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007. Beijing, China.

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