| "Sketch and Peel" Lithography for High-Resolution Multiscale Patterning. | |
| Chen, YQ; Xiang, Q; Li, ZQ; Wang, YS; Meng, YH; Duan, HG | |
| 刊名 | Nano Lett
 |
| 2016 | |
| 卷号 | Vol.16 No.5页码:3253-3259 |
| 关键词 | Multiscale patterning electron-beam lithography nanogaps plasmonics selective peeling |
| ISSN号 | 1530-6984 |
| URL标识 | 查看原文 |
| 公开日期 | [db:dc_date_available] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/6068923 |
| 专题 | 湖南大学 |
| 作者单位 | Hunan Univ, State Key Lab Chem Biosensing & Chemometr, Key Lab Micronano Optoelect Devices, Sch Phys & Elect,Minist Educ, Changsha 410082, Hunan, Peoples R China |
| 推荐引用方式 GB/T 7714 | Chen, YQ,Xiang, Q,Li, ZQ,et al. "Sketch and Peel" Lithography for High-Resolution Multiscale Patterning.[J]. Nano Lett,2016,Vol.16 No.5:3253-3259. |
| APA | Chen, YQ,Xiang, Q,Li, ZQ,Wang, YS,Meng, YH,&Duan, HG.(2016)."Sketch and Peel" Lithography for High-Resolution Multiscale Patterning..Nano Lett,Vol.16 No.5,3253-3259. |
| MLA | Chen, YQ,et al.""Sketch and Peel" Lithography for High-Resolution Multiscale Patterning.".Nano Lett Vol.16 No.5(2016):3253-3259. |
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