Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface | |
Ning Jian-Ping; Lue Xiao-Dan; Zhao Cheng-Li; Qin You-Min; He Ping-Ni; Bogaerts, A.; Gou Fu-Jun | |
2010 | |
卷号 | 59期号:10页码:7225-7231 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000283406400078 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5992451 |
专题 | 贵州大学 |
作者单位 | 1.[1]Minist Educ, Key Lab Radiat Phys & Technol, Chengdu 610064, Peoples R China 2.[2]Guizhou Univ, Inst Plasma Surface Interact, Guiyang 550025, Peoples R China 3.[3]Coll Guizhou Univ, Guiyang 550003, Peoples R China 4.[4]Univ Antwerp, Res Grp PLASMANT, B-2610 Antwerp, Belgium 5.[5]Fdn Mat Inst Plasma Phys, NL-3439 MN Nieuwegein, Netherlands |
推荐引用方式 GB/T 7714 | Ning Jian-Ping,Lue Xiao-Dan,Zhao Cheng-Li,et al. Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface[J],2010,59(10):7225-7231. |
APA | Ning Jian-Ping.,Lue Xiao-Dan.,Zhao Cheng-Li.,Qin You-Min.,He Ping-Ni.,...&Gou Fu-Jun.(2010).Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface.,59(10),7225-7231. |
MLA | Ning Jian-Ping,et al."Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface".59.10(2010):7225-7231. |
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