| Properties of NiOx and its influence upon all-thin-film ITO/NiOx/LiTaO3/WO3/ITO electrochromic devices prepared by magnetron sputtering | |
| Song, Xingwang; Dong, Guobo; Gao, Fangyuan; Xiao, Yu; Liu, Qirong; Diao, Xungang | |
| 刊名 | VACUUM
 |
| 2015 | |
| 卷号 | 111页码:48-54 |
| 关键词 | NiOx films Electrochromic device All-thin-film |
| ISSN号 | 0042-207X |
| DOI | 10.1016/j.vacuum.2014.09.007 |
| URL标识 | 查看原文 |
| 收录类别 | SCIE ; EI |
| WOS记录号 | WOS:000347510300009 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5960206 |
| 专题 | 北京航空航天大学 |
| 推荐引用方式 GB/T 7714 | Song, Xingwang,Dong, Guobo,Gao, Fangyuan,et al. Properties of NiOx and its influence upon all-thin-film ITO/NiOx/LiTaO3/WO3/ITO electrochromic devices prepared by magnetron sputtering[J]. VACUUM,2015,111:48-54. |
| APA | Song, Xingwang,Dong, Guobo,Gao, Fangyuan,Xiao, Yu,Liu, Qirong,&Diao, Xungang.(2015).Properties of NiOx and its influence upon all-thin-film ITO/NiOx/LiTaO3/WO3/ITO electrochromic devices prepared by magnetron sputtering.VACUUM,111,48-54. |
| MLA | Song, Xingwang,et al."Properties of NiOx and its influence upon all-thin-film ITO/NiOx/LiTaO3/WO3/ITO electrochromic devices prepared by magnetron sputtering".VACUUM 111(2015):48-54. |
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