| One-time multi-depth silicon etching method based on SiO2masking layer | |
| Tan, Xiao; Tao, Zhi; Xu, Tiantong; Li, Haiwang | |
| 2016 | |
| 会议名称 | ASME 2016 5th International Conference on Micro/Nanoscale Heat and Mass Transfer, MNHMT 2016 |
| 会议日期 | 2016-01-04 |
| 会议地点 | Biopolis, Singapore |
| 卷号 | 2 |
| 收录类别 | EI |
| URL标识 | 查看原文 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5947891 |
| 专题 | 北京航空航天大学 |
| 推荐引用方式 GB/T 7714 | Tan, Xiao,Tao, Zhi,Xu, Tiantong,et al. One-time multi-depth silicon etching method based on SiO2masking layer[C]. 见:ASME 2016 5th International Conference on Micro/Nanoscale Heat and Mass Transfer, MNHMT 2016. Biopolis, Singapore. 2016-01-04. |
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