Electrically reversible cracks in an intermetallic film controlled by an electric field | |
Liu, Z. Q.; Liu, J. H.; Biegalski, M. D.; Hu, J.M.; Shang, S. L.; Ji, Y.; Wang, J. M.; Hsu, S. L.; Wong, A. T.; Cordill, M. J. | |
刊名 | NATURE COMMUNICATIONS
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2018 | |
卷号 | 9页码:41 |
关键词 | electric field film frequency analysis instrumentation substrate thin section |
ISSN号 | 2041-1723 |
DOI | 10.1038/s41467-017-02454-8 |
URL标识 | 查看原文 |
收录类别 | SCIE ; PUBMED |
WOS记录号 | WOS:000419308000002 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5935827 |
专题 | 北京航空航天大学 |
推荐引用方式 GB/T 7714 | Liu, Z. Q.,Liu, J. H.,Biegalski, M. D.,et al. Electrically reversible cracks in an intermetallic film controlled by an electric field[J]. NATURE COMMUNICATIONS,2018,9:41. |
APA | Liu, Z. Q..,Liu, J. H..,Biegalski, M. D..,Hu, J.M..,Shang, S. L..,...&Ramesh, R..(2018).Electrically reversible cracks in an intermetallic film controlled by an electric field.NATURE COMMUNICATIONS,9,41. |
MLA | Liu, Z. Q.,et al."Electrically reversible cracks in an intermetallic film controlled by an electric field".NATURE COMMUNICATIONS 9(2018):41. |
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