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	Elimination of Bimodal Size in InAs/GaAs Quantum Dots for Preparation of 1.3-mu m Quantum Dot Lasers
	Su, Xiang-Bin; Ding, Ying; Ma, Ben; Zhang, Ke-Lu; Chen, Ze-Sheng; Li, Jing-Lun; Cui, Xiao-Ran; Xu, Ying-Qiang; Ni, Hai-Qiao; Niu, Zhi-Chuan
刊名	NANOSCALE RESEARCH LETTERS
	2018
卷号	13
关键词	Quantum dot (QD) Annealing Bimodal size Molecular beam epitaxy (MBE) Laser
ISSN号	1556-276X
DOI	10.1186/s11671-018-2472-y
URL标识	查看原文
收录类别	SCIE ; EI
WOS记录号	WOS:000426313300002
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5935118
专题	北京航空航天大学
推荐引用方式 GB/T 7714	Su, Xiang-Bin,Ding, Ying,Ma, Ben,et al. Elimination of Bimodal Size in InAs/GaAs Quantum Dots for Preparation of 1.3-mu m Quantum Dot Lasers[J]. NANOSCALE RESEARCH LETTERS,2018,13.
APA	Su, Xiang-Bin.,Ding, Ying.,Ma, Ben.,Zhang, Ke-Lu.,Chen, Ze-Sheng.,...&Niu, Zhi-Chuan.(2018).Elimination of Bimodal Size in InAs/GaAs Quantum Dots for Preparation of 1.3-mu m Quantum Dot Lasers.NANOSCALE RESEARCH LETTERS,13.
MLA	Su, Xiang-Bin,et al."Elimination of Bimodal Size in InAs/GaAs Quantum Dots for Preparation of 1.3-mu m Quantum Dot Lasers".NANOSCALE RESEARCH LETTERS 13(2018).

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