Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing | |
Gao, Ming; Zhang, Huarui; Xie, Yanjun; Miao, Lei; Yao, Wei; Zhang, Fengge; Wang, Tiejun; Zhang, Hu | |
刊名 | CERAMICS INTERNATIONAL
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2018 | |
卷号 | 44页码:5486-5491 |
关键词 | Al:ZnO Hot isostatic pressing Microstructure Magnetron sputtering |
ISSN号 | 0272-8842 |
DOI | 10.1016/j.ceramint.2017.12.182 |
URL标识 | 查看原文 |
收录类别 | SCIE |
WOS记录号 | WOS:000425204400126 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5934460 |
专题 | 北京航空航天大学 |
推荐引用方式 GB/T 7714 | Gao, Ming,Zhang, Huarui,Xie, Yanjun,et al. Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing[J]. CERAMICS INTERNATIONAL,2018,44:5486-5491. |
APA | Gao, Ming.,Zhang, Huarui.,Xie, Yanjun.,Miao, Lei.,Yao, Wei.,...&Zhang, Hu.(2018).Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing.CERAMICS INTERNATIONAL,44,5486-5491. |
MLA | Gao, Ming,et al."Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing".CERAMICS INTERNATIONAL 44(2018):5486-5491. |
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