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Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing
Gao, Ming; Zhang, Huarui; Xie, Yanjun; Miao, Lei; Yao, Wei; Zhang, Fengge; Wang, Tiejun; Zhang, Hu
刊名CERAMICS INTERNATIONAL
2018
卷号44页码:5486-5491
关键词Al:ZnO Hot isostatic pressing Microstructure Magnetron sputtering
ISSN号0272-8842
DOI10.1016/j.ceramint.2017.12.182
URL标识查看原文
收录类别SCIE
WOS记录号WOS:000425204400126
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5934460
专题北京航空航天大学
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GB/T 7714
Gao, Ming,Zhang, Huarui,Xie, Yanjun,et al. Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing[J]. CERAMICS INTERNATIONAL,2018,44:5486-5491.
APA Gao, Ming.,Zhang, Huarui.,Xie, Yanjun.,Miao, Lei.,Yao, Wei.,...&Zhang, Hu.(2018).Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing.CERAMICS INTERNATIONAL,44,5486-5491.
MLA Gao, Ming,et al."Characteristics of ultra-high density Al:ZnO sputtering targets prepared by hot isostatic pressing".CERAMICS INTERNATIONAL 44(2018):5486-5491.
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