Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings | |
Tang, Shiyun; Liu, Tao; Duan, Shuiping; Guo, Junjiang; Tang, Anjiang | |
2019 | |
卷号 | 7期号:9 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000489121800027 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5837437 |
专题 | 贵州理工学院 |
作者单位 | 1.[1]Guizhou Inst Technol, Coll Chem Engn, Guiyang 550003, Guizhou, Peoples R China 2.[2]Engn Technol Res Ctr Fluorine & Silicon Mat, Guiyang 550003, Guizhou, Peoples R China |
推荐引用方式 GB/T 7714 | Tang, Shiyun,Liu, Tao,Duan, Shuiping,et al. Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings[J],2019,7(9). |
APA | Tang, Shiyun,Liu, Tao,Duan, Shuiping,Guo, Junjiang,&Tang, Anjiang.(2019).Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings.,7(9). |
MLA | Tang, Shiyun,et al."Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings".7.9(2019). |
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