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Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings
Tang, Shiyun; Liu, Tao; Duan, Shuiping; Guo, Junjiang; Tang, Anjiang
2019
卷号7期号:9
URL标识查看原文
WOS记录号WOS:000489121800027
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5837437
专题贵州理工学院
作者单位1.[1]Guizhou Inst Technol, Coll Chem Engn, Guiyang 550003, Guizhou, Peoples R China
2.[2]Engn Technol Res Ctr Fluorine & Silicon Mat, Guiyang 550003, Guizhou, Peoples R China
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GB/T 7714
Tang, Shiyun,Liu, Tao,Duan, Shuiping,et al. Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings[J],2019,7(9).
APA Tang, Shiyun,Liu, Tao,Duan, Shuiping,Guo, Junjiang,&Tang, Anjiang.(2019).Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings.,7(9).
MLA Tang, Shiyun,et al."Comparison of Growth Characteristics and Properties of CVD TiN and TiO2 Anti-Coking Coatings".7.9(2019).
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