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	Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering
	Xianwu Xiu[1]; Yuping Cao[1]; Zhiyong Pang[2]; Shenghao Han[2,3]
	2009
卷号	25期号:6页码:785-788
关键词	ZnO薄膜 溅射制备 磁控溅射 钼掺杂 基片温度 射频 性质 衬底温度
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5793068
专题	山东师范大学
作者单位	1.[1]College of Physics and Electronics, Shandong Normal University, Jinan 250014, China 2.[2]School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China 3.[3]School of Space Science and Physics, Shandong University at Weihai, Weihai 264209, China
推荐引用方式 GB/T 7714	Xianwu Xiu[1],Yuping Cao[1],Zhiyong Pang[2],et al. Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering[J],2009,25(6):785-788.
APA	Xianwu Xiu[1],Yuping Cao[1],Zhiyong Pang[2],&Shenghao Han[2,3].(2009).Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering.,25(6),785-788.
MLA	Xianwu Xiu[1],et al."Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering".25.6(2009):785-788.

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