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	Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量：SCI原文链接
	Shi, Feng[1,2]; Cui, Chuanwen[1,2]
	2010
卷号	46期号:5页码:565-569
URL标识	查看原文
WOS记录号	WOS:000277428000023
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5791644
专题	山东师范大学
作者单位	1.[1]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China 2.[2]Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
推荐引用方式 GB/T 7714	Shi, Feng[1,2],Cui, Chuanwen[1,2]. Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量：SCI原文链接[J],2010,46(5):565-569.
APA	Shi, Feng[1,2],&Cui, Chuanwen[1,2].(2010).Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量：SCI原文链接.,46(5),565-569.
MLA	Shi, Feng[1,2],et al."Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量：SCI原文链接".46.5(2010):565-569.

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