Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量:SCI原文链接 | |
Shi, Feng[1,2]; Cui, Chuanwen[1,2] | |
2010 | |
卷号 | 46期号:5页码:565-569 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000277428000023 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5791644 |
专题 | 山东师范大学 |
作者单位 | 1.[1]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China 2.[2]Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China |
推荐引用方式 GB/T 7714 | Shi, Feng[1,2],Cui, Chuanwen[1,2]. Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量:SCI原文链接[J],2010,46(5):565-569. |
APA | Shi, Feng[1,2],&Cui, Chuanwen[1,2].(2010).Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量:SCI原文链接.,46(5),565-569. |
MLA | Shi, Feng[1,2],et al."Effect of annealing temperature on microstructure of microwave dielectric ceramic thin films fabricated by RF magnetron sputteringSCI被引量:SCI原文链接".46.5(2010):565-569. |
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