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	Influence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy
	Yunyan Liu[1]; Shanying Yang[2]; Gongxiang Wei[1]; Jiaoqing Pan[3]; Yuzhen Yuan[1]; Chuanfu Cheng[4]
	2013
期号	12页码:1134-1138
关键词	ZnO薄膜 衬底温度 分子束外延法 应力和 激光 原子力显微镜方法 粗糙度指数 分子束外延技术
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5783830
专题	山东师范大学
作者单位	1.[1]School of Science,Shandong University of Technology 2.[2]Laiwu Vocational and Technical College 3.[3]Key Laboratory of Semiconductor Materials Science,Institute of Semiconductors,Chinese Academy of Sciences 4.[4]College of Physics and Electronics,Shandong Normal University
推荐引用方式 GB/T 7714	Yunyan Liu[1],Shanying Yang[2],Gongxiang Wei[1],et al. Influence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy[J],2013(12):1134-1138.
APA	Yunyan Liu[1],Shanying Yang[2],Gongxiang Wei[1],Jiaoqing Pan[3],Yuzhen Yuan[1],&Chuanfu Cheng[4].(2013).Influence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy.(12),1134-1138.
MLA	Yunyan Liu[1],et al."Influence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy"..12(2013):1134-1138.

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