| The effect of substrate bias voltage on PbTe films deposited by magnetron sputteringSCI被引量：SCI原文链接 | |
| Ren, Wei[1]; Cao, Wentian[1]; Wang, Shuyun[1]; Sui, Mingxiao[1]; Lu, Huifen[1] | |
| 2011 | |
| 卷号 | 509期号:20页码:5947-5951 |
| URL标识 | 查看原文 |
| WOS记录号 | WOS:000289462600006 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5783263 |
| 专题 | 山东师范大学 |
| 作者单位 | [1]Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ren, Wei[1],Cao, Wentian[1],Wang, Shuyun[1],等. The effect of substrate bias voltage on PbTe films deposited by magnetron sputteringSCI被引量：SCI原文链接[J],2011,509(20):5947-5951. |
| APA | Ren, Wei[1],Cao, Wentian[1],Wang, Shuyun[1],Sui, Mingxiao[1],&Lu, Huifen[1].(2011).The effect of substrate bias voltage on PbTe films deposited by magnetron sputteringSCI被引量：SCI原文链接.,509(20),5947-5951. |
| MLA | Ren, Wei[1],et al."The effect of substrate bias voltage on PbTe films deposited by magnetron sputteringSCI被引量：SCI原文链接".509.20(2011):5947-5951. |
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