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	Kinetic process of oxidative leaching of chalcopyrite under low oxygen pressure and low temperature
	Qiu TS(邱廷省); Nie GH(聂光华); Wang JF(王俊峰); Cui LF(崔立凤)
	2007
卷号	17期号:2页码:418-422
关键词	黄铜矿 氧化浸出 低温 低氧压 动力学过程
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5760010
专题	贵州大学
作者单位	1.[1]School of Environmental and Architectural Engineering, Jiangxi University of Science and Technology, Ganzhou 341000, China 2.[2]School of Mineral Engineering, Guizhou University, Guiyang 550003, China
推荐引用方式 GB/T 7714	Qiu TS,Nie GH,Wang JF,et al. Kinetic process of oxidative leaching of chalcopyrite under low oxygen pressure and low temperature[J],2007,17(2):418-422.
APA	Qiu TS,Nie GH,Wang JF,&Cui LF.(2007).Kinetic process of oxidative leaching of chalcopyrite under low oxygen pressure and low temperature.,17(2),418-422.
MLA	Qiu TS,et al."Kinetic process of oxidative leaching of chalcopyrite under low oxygen pressure and low temperature".17.2(2007):418-422.

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