CORC  > 中南林业科技大学
Study of molecular-beam epitaxy growth on patterned GaAs (1 0 0) substrates by masked indium ion implantation
Zhou, Huiying; Qu, Shengchun*; Jin, Peng; Xu, Bo; Ye, Xiaoling; Liu, Junpeng; Wang, Zhanguo
刊名Journal of Crystal Growth
2011
卷号318期号:1页码:572-575
关键词A1. Atom force microscopy A1. Nanostructures A3. Molecular-beam epitaxy B1. Nanomaterials B2. Semiconducting gallium arsenide
ISSN号0022-0248
DOI10.1016/j.jcrysgro.2010.10.176
会议名称16th International Conference on Crystal Growth (ICCG16)/14th International Conference on Vapor Growth and Epitaxy (ICVGE14)
URL标识查看原文
会议地点Beijing, PEOPLES R CHINA
会议日期AUG 08-13, 2010
WOS记录号WOS:000289653900121;EI:20111213767816
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5726559
专题中南林业科技大学
作者单位1.[Ye, Xiaoling
2.Xu, Bo
3.Zhou, Huiying
4.Wang, Zhanguo
5.Qu, Shengchun
6.Jin, Peng
7.Liu, Junpeng] Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China.
推荐引用方式
GB/T 7714
Zhou, Huiying,Qu, Shengchun*,Jin, Peng,et al. Study of molecular-beam epitaxy growth on patterned GaAs (1 0 0) substrates by masked indium ion implantation[J]. Journal of Crystal Growth,2011,318(1):572-575.
APA Zhou, Huiying.,Qu, Shengchun*.,Jin, Peng.,Xu, Bo.,Ye, Xiaoling.,...&Wang, Zhanguo.(2011).Study of molecular-beam epitaxy growth on patterned GaAs (1 0 0) substrates by masked indium ion implantation.Journal of Crystal Growth,318(1),572-575.
MLA Zhou, Huiying,et al."Study of molecular-beam epitaxy growth on patterned GaAs (1 0 0) substrates by masked indium ion implantation".Journal of Crystal Growth 318.1(2011):572-575.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace