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	Orthogonal analysis for perovskite structure microwave dielectric ceramic thin films fabricated by the RF magnetron-sputtering method
	Cui Chuanwen; Shi Feng; Li Yuguo; Wang Shuyun
刊名	JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
	2010
卷号	21期号:4页码:349-354
DOI	10.1007/s10854-009-9919-y
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5510690
专题	山东大学
作者单位	1.Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Shandong, Peoples R China. 2.[Cui Chuanwen 3.Sh
推荐引用方式 GB/T 7714	Cui Chuanwen,Shi Feng,Li Yuguo,et al. Orthogonal analysis for perovskite structure microwave dielectric ceramic thin films fabricated by the RF magnetron-sputtering method[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2010,21(4):349-354.
APA	Cui Chuanwen,Shi Feng,Li Yuguo,&Wang Shuyun.(2010).Orthogonal analysis for perovskite structure microwave dielectric ceramic thin films fabricated by the RF magnetron-sputtering method.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,21(4),349-354.
MLA	Cui Chuanwen,et al."Orthogonal analysis for perovskite structure microwave dielectric ceramic thin films fabricated by the RF magnetron-sputtering method".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 21.4(2010):349-354.

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