Microstructure of microwave dielectricthin films by RF magnetron sputtering | |
Shi, Feng; Cui, Chuanwen | |
刊名 | APPLIED SURFACE SCIENCE
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2010 | |
卷号 | 256期号:8页码:2626-2629 |
关键词 | Microwave dielectric ceramic Thin films Radio frequency magnetron-sputtering Microstructure |
DOI | 10.1016/j.apsusc.2009.11.007 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5489742 |
专题 | 山东大学 |
作者单位 | 1.Shandong Normal Univ, Coll Phys & Elect, Jinan 250014, Peoples R China. 2.Shandong Univ, State |
推荐引用方式 GB/T 7714 | Shi, Feng,Cui, Chuanwen. Microstructure of microwave dielectricthin films by RF magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2010,256(8):2626-2629. |
APA | Shi, Feng,&Cui, Chuanwen.(2010).Microstructure of microwave dielectricthin films by RF magnetron sputtering.APPLIED SURFACE SCIENCE,256(8),2626-2629. |
MLA | Shi, Feng,et al."Microstructure of microwave dielectricthin films by RF magnetron sputtering".APPLIED SURFACE SCIENCE 256.8(2010):2626-2629. |
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