| Influence of annealing temperature on the properties of ZnO:Zr films deposited by direct current magnetron sputtering | |
| Zhang, Huafu; Liu, Hanfa; Feng, Liu | |
| 刊名 | VACUUM
 |
| 2010 | |
| 卷号 | 84期号:6页码:833-836 |
| 关键词 | Zirconium-doped zinc oxide Annealing temperature DC magnetron sputtering Thin films |
| DOI | 10.1016/j.vacuum.2009.11.005 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5488746 |
| 专题 | 山东大学 |
| 作者单位 | 1.Shandong Univ Technol, Sch Sci, Zibo 255049, Shandong, Peoples R China. 2.Shandong Univ Technol, Anal & Testin |
| 推荐引用方式 GB/T 7714 | Zhang, Huafu,Liu, Hanfa,Feng, Liu. Influence of annealing temperature on the properties of ZnO:Zr films deposited by direct current magnetron sputtering[J]. VACUUM,2010,84(6):833-836. |
| APA | Zhang, Huafu,Liu, Hanfa,&Feng, Liu.(2010).Influence of annealing temperature on the properties of ZnO:Zr films deposited by direct current magnetron sputtering.VACUUM,84(6),833-836. |
| MLA | Zhang, Huafu,et al."Influence of annealing temperature on the properties of ZnO:Zr films deposited by direct current magnetron sputtering".VACUUM 84.6(2010):833-836. |
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