QQ客服 官方微博 反馈留言

	Double EWMA controller for semiconductor manufacturing processes with time-varying metrology delay
	Wan, Li[1]; Pan, Tianhong[2]
	2015
会议名称	5th Annual IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems, IEEE-CYBER 2015
会议日期	2015-06-09
页码	394-397
收录类别	EI
URL标识	查看原文
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/5381022
专题	江苏大学
作者单位	[1]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, China[2]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, China
推荐引用方式 GB/T 7714	Wan, Li[1],Pan, Tianhong[2]. Double EWMA controller for semiconductor manufacturing processes with time-varying metrology delay[C]. 见:5th Annual IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems, IEEE-CYBER 2015. 2015-06-09.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。