Double EWMA controller for semiconductor manufacturing processes with time-varying metrology delay | |
Wan, Li[1]; Pan, Tianhong[2] | |
2015 | |
会议名称 | 5th Annual IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems, IEEE-CYBER 2015 |
会议日期 | 2015-06-09 |
页码 | 394-397 |
收录类别 | EI |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5381022 |
专题 | 江苏大学 |
作者单位 | [1]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, China[2]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, China |
推荐引用方式 GB/T 7714 | Wan, Li[1],Pan, Tianhong[2]. Double EWMA controller for semiconductor manufacturing processes with time-varying metrology delay[C]. 见:5th Annual IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems, IEEE-CYBER 2015. 2015-06-09. |
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