| Double EWMA controller for Semiconductor Manufacturing Processes with Time-varying Metrology Delay | |
| Wan, Li[1]; Pan, Tianhong[2] | |
| 2015 | |
| 会议名称 | 2015 IEEE International Conference on Cyber Technology in Automation, Control, and Intelligent Systems (CYBER) |
| 关键词 | run-to-run control double exponent weighted moving average metrology delay Bayesian theory |
| 页码 | 394-397 |
| 收录类别 | CPCI-S |
| URL标识 | 查看原文 |
| WOS记录号 | WOS:000380502300076 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5378173 |
| 专题 | 江苏大学 |
| 作者单位 | 1.[1]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 2.[2]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Wan, Li[1],Pan, Tianhong[2]. Double EWMA controller for Semiconductor Manufacturing Processes with Time-varying Metrology Delay[C]. 见:2015 IEEE International Conference on Cyber Technology in Automation, Control, and Intelligent Systems (CYBER). |
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