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	Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods
	Zhang, Liqiang[1]; Xu, Chaoyan[2]; Tang, Yunqing[3]
刊名	International Journal of Materials and Structural Integrity
	2015
卷号	8期号:4页码:303-309
ISSN号	17450055
DOI	http://dx.doi.org/10.1504/IJMSI.2014.067117
URL标识	查看原文
收录类别	EI
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5376400
专题	江苏大学
作者单位	[1]Laboratory of Span-Scale Design and Manufacturing MEMS/NEMS/OEDS, School of Mechanical Engineering, Jiangsu University, Zhenjiang, China [2]School of Mechanical Engineering, Jiangsu University, Zhenjiang, China [3]Laboratory of Advanced Manufacturing and Reliability for MEMS/NEMS/OEDS, School of Mechanical Engineering, Jiangsu University, Zhenjiang, China
推荐引用方式 GB/T 7714	Zhang, Liqiang[1],Xu, Chaoyan[2],Tang, Yunqing[3]. Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods[J]. International Journal of Materials and Structural Integrity,2015,8(4):303-309.
APA	Zhang, Liqiang[1],Xu, Chaoyan[2],&Tang, Yunqing[3].(2015).Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods.International Journal of Materials and Structural Integrity,8(4),303-309.
MLA	Zhang, Liqiang[1],et al."Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods".International Journal of Materials and Structural Integrity 8.4(2015):303-309.

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