Run-to-run control for semiconductor manufacturing processes using extended state observer | |
Wang, Haiyan[1]; Tan, Fei[2]; Sheng, Biqi[3]; Bian, Jun[4]; Pan, Tianhong[5] | |
2016 | |
会议名称 | 28th Chinese Control and Decision Conference, CCDC 2016 |
会议日期 | 2016-05-28 |
页码 | 854-857 |
收录类别 | EI |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5369692 |
专题 | 江苏大学 |
作者单位 | [1]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, 2013, China [2]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, 2013, China [3]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, 2013, China |China Maritime Police Academy, Ningbo, Zhejiang, 315801, China[4]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, 2013, China [5]School of Electrical Information and Engineering, Jiangsu University, Zhenjiang, Jiangsu, 2013, China |
推荐引用方式 GB/T 7714 | Wang, Haiyan[1],Tan, Fei[2],Sheng, Biqi[3],et al. Run-to-run control for semiconductor manufacturing processes using extended state observer[C]. 见:28th Chinese Control and Decision Conference, CCDC 2016. 2016-05-28. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论