Run-to-Run Control for Semiconductor Manufacturing Processes using Extended State Observer | |
Wang, Haiyan[1]; Tan, Fei[2]; Sheng, Biqi[3]; Bian, Jun[4]; Pan, Tianhong[5] | |
2016 | |
会议名称 | 28th Chinese Control and Decision Conference |
会议日期 | 2016-01-01 |
关键词 | Extended State Observer (ESO) Run-to-run (R2R) control EWMA |
页码 | 854-857 |
收录类别 | CPCI-S |
URL标识 | 查看原文 |
WOS记录号 | WOS:000383222301017 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5365004 |
专题 | 江苏大学 |
作者单位 | 1.[1]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 2.[2]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 3.[3]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 4.China Maritime Police Acad, Ningbo 315801, Zhejiang, Peoples R China. 5.[4]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 6.[5]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. |
推荐引用方式 GB/T 7714 | Wang, Haiyan[1],Tan, Fei[2],Sheng, Biqi[3],et al. Run-to-Run Control for Semiconductor Manufacturing Processes using Extended State Observer[C]. 见:28th Chinese Control and Decision Conference. 2016-01-01. |
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