Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation
Liu XM(刘小明); Liu ZL; Wei YG(魏悦广); Liu, XM
刊名TRIBOLOGY LETTERS
2012-05-01
通讯作者邮箱xiaomingliu@lnm.imech.ac.cn
卷号46期号:2页码:167-178
关键词Nanotribology Friction reducing Friction mechanisms Films Dynamic modeling Molecular-Dynamics Simulation Randomly Rough Surfaces Dislocation Nucleation Atomistic Simulation Contact Mechanics Film Thickness Thin-Films Nanoindentation Deformation Multilayers
ISSN号1023-8883
通讯作者Liu, XM ; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China.
产权排序[Liu, X. M.;Wei, Y. G.] Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China; [Liu, Z. L.] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA
合作状况国际
中文摘要The friction behavior of the nanoscratching process is investigated using molecular dynamic simulations by considering a sphere indenter sliding against a nickel nanofilm structure. In the film/substrate system, the interface-dominated friction process is studied during the nanoscratch process. The results indicate that the interface accommodates deformation during the scratch by absorbing plastic deformation (such as stacking faults and partial dislocations) and by allowing locally interface slip. The observed local material shuffling beneath the tip that was strongly affected by the interface and friction mechanisms, including material ploughing along the track, filling in of the track, and piling up of the chip in front of the tip, are discussed. The combination effects of both scratching depths and film thicknesses were also investigated.
学科主题新型材料的力学问题
收录类别SCI ; EI
资助信息This work was supported by the National Natural Science Foundation of China ( Grants Nos. 10772096, 11021262, 10932011 and 91116003), and by the National Basic Research Program of China through 2012CB937500. The authors gratefully acknowledge useful discussions with Prof. F. P. Yuan from LNM at the Institute of Mechanics, Chinese Academy of Sciences.
原文出处http://dx.doi.org/10.1007/s11249-012-9932-9
语种英语
WOS记录号WOS:000302251500008
公开日期2013-01-18
内容类型期刊论文
源URL[http://dspace.imech.ac.cn/handle/311007/46703]  
专题力学研究所_非线性力学国家重点实验室
通讯作者Liu, XM
推荐引用方式
GB/T 7714
Liu XM,Liu ZL,Wei YG,et al. Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation[J]. TRIBOLOGY LETTERS,2012,46(2):167-178.
APA 刘小明,Liu ZL,魏悦广,&Liu, XM.(2012).Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation.TRIBOLOGY LETTERS,46(2),167-178.
MLA 刘小明,et al."Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation".TRIBOLOGY LETTERS 46.2(2012):167-178.
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