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	Run-to-Run Control for Semiconductor Manufacturing Processes using Extended State Observer
	Wang, Haiyan[1]; Tan, Fei[2]; Sheng, Biqi[3]; Bian, Jun[4]; Pan, Tianhong[5]
	2016
会议名称	PROCEEDINGS OF THE 28TH CHINESE CONTROL AND DECISION CONFERENCE (2016 CCDC)
关键词	Extended State Observer (ESO) Run-to-run (R2R) control EWMA
页码	854-857
收录类别	CPCI-S
URL标识	查看原文
WOS记录号	WOS:000383222301017
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/5357311
专题	江苏大学
作者单位	1.[1]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 2.[2]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 3.[3]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 4.China Maritime Police Acad, Ningbo 315801, Zhejiang, Peoples R China. 5.[4]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China. 6.[5]Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China.
推荐引用方式 GB/T 7714	Wang, Haiyan[1],Tan, Fei[2],Sheng, Biqi[3],et al. Run-to-Run Control for Semiconductor Manufacturing Processes using Extended State Observer[C]. 见:PROCEEDINGS OF THE 28TH CHINESE CONTROL AND DECISION CONFERENCE (2016 CCDC).

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