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	Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering
	Wang, Tian-yu[1]; Li, Bao-jia[2]; Ren, Nai-fei[3]; Huang, Li-jing[4]; Li, Huang[5]
刊名	MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
	2019
卷号	91页码:73-80
关键词	ZnO Al Cu Multilayer Magnetron sputtering Photoelectric property
ISSN号	1369-8001
DOI	http://dx.doi.org/10.1016/j.mssp.2018.11.013
URL标识	查看原文
收录类别	SCI(E) ; EI
WOS记录号	WOS:000454537700011
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5324974
专题	江苏大学
作者单位	1.[1]Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China. 2.Jiangsu Univ, Ctr Photon Mfg Sci & Technol, Jiangsu Prov Key Lab, Zhenjiang 212013, Peoples R China. 3.[2]Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China. 4.Jiangsu Univ, Ctr Photon Mfg Sci & Technol, Jiangsu Prov Key Lab, Zhenjiang 212013, Peoples R China. 5.[3]Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China. 6.Jiangsu Univ, Ctr Photon Mfg Sci & Technol, Jiangsu Prov Key Lab, Zhenjiang 212013, Peoples R China. 7.[4]Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China. 8.Jiangsu Univ, Ctr Photon Mfg Sci & Technol, Jiangsu Prov Key Lab, Zhenjiang 212013, Peoples R China. 9.Jiangsu Univ, Inst Micronano Optoelect & Terahertz Technol, Zhenjiang 212013, Peoples R China. 10.[5]Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China.
推荐引用方式 GB/T 7714	Wang, Tian-yu[1],Li, Bao-jia[2],Ren, Nai-fei[3],et al. Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering[J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,2019,91:73-80.
APA	Wang, Tian-yu[1],Li, Bao-jia[2],Ren, Nai-fei[3],Huang, Li-jing[4],&Li, Huang[5].(2019).Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,91,73-80.
MLA	Wang, Tian-yu[1],et al."Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering".MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 91(2019):73-80.

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