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	Tuning bond contents in B-C-N films via temperature and bias voltage within RF magnetron sputtering
	Zhuang, Chunqiang; Zhao, Jijun; Jia, Fuchao; Guan, Changyu; Wu, Zhanling; Bai, Yizhen; Jiang, Xin
刊名	SURFACE & COATINGS TECHNOLOGY
	2009
卷号	204页码:713-717
关键词	Magnetron sputtering Bond content BCN
ISSN号	0257-8972
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5322878
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Lab Mat Modificat Laser Electron & Ion Beams, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Coll Adv Sci & Technol, Dalian 116024, Peoples R China. 3.Dalian Univ Technol, Lab Mat Modificat Laser Electron & Ion Beams, Dalian 116024, Peoples R China. 4.Dalian Univ Technol, Lab Mat Modificat Laser Electron & Ion Beams, Dalian 116024, Peoples R China. 5.Dalian Univ Technol, Coll Adv Sci & Technol, Dalian 116024, Peoples R China. 6.Univ Siegen, Inst Mat Engn, D-57076 Siegen, Germany.
推荐引用方式 GB/T 7714	Zhuang, Chunqiang,Zhao, Jijun,Jia, Fuchao,et al. Tuning bond contents in B-C-N films via temperature and bias voltage within RF magnetron sputtering[J]. SURFACE & COATINGS TECHNOLOGY,2009,204:713-717.
APA	Zhuang, Chunqiang.,Zhao, Jijun.,Jia, Fuchao.,Guan, Changyu.,Wu, Zhanling.,...&Jiang, Xin.(2009).Tuning bond contents in B-C-N films via temperature and bias voltage within RF magnetron sputtering.SURFACE & COATINGS TECHNOLOGY,204,713-717.
MLA	Zhuang, Chunqiang,et al."Tuning bond contents in B-C-N films via temperature and bias voltage within RF magnetron sputtering".SURFACE & COATINGS TECHNOLOGY 204(2009):713-717.

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