Discontinuous patterned bonds for semiconductor devices and associated systems and methods
SCHELLHAMMER, SCOTT, D.; ODNOBLYUDOV, VLADIMIR; FREI, JEREMY, S.
2018-05-16
著作权人MICRON TECHNOLOGY, INC.
专利号EP2751831B1
国家欧洲专利局
文献子类授权发明
其他题名Discontinuous patterned bonds for semiconductor devices and associated systems and methods
英文摘要Discontinuous bonds for semiconductor devices are disclosed herein. A device in accordance with a particular embodiment includes a first substrate and a second substrate, with at least one of the first substrate and the second substrate having a plurality of solid-state transducers. The second substrate can include a plurality of projections and a plurality of intermediate regions and can be bonded to the first substrate with a discontinuous bond. Individual solid-state transducers can be disposed at least partially within corresponding intermediate regions and the discontinuous bond can include bonding material bonding the individual solid-state transducers to blind ends of corresponding intermediate regions. Associated methods and systems of discontinuous bonds for semiconductor devices are disclosed herein.
公开日期2018-05-16
申请日期2012-08-14
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/37601]  
专题半导体激光器专利数据库
作者单位MICRON TECHNOLOGY, INC.
推荐引用方式
GB/T 7714
SCHELLHAMMER, SCOTT, D.,ODNOBLYUDOV, VLADIMIR,FREI, JEREMY, S.. Discontinuous patterned bonds for semiconductor devices and associated systems and methods. EP2751831B1. 2018-05-16.
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