| 保護膜形成用材料 | |
| 滝西 文貴; 東郷 真紀子; 遠藤 昌之; 横山 泰明 | |
| 1999-03-05 | |
| 著作权人 | ジェイエスアール株式会社 |
| 专利号 | JP2893875B2 |
| 国家 | 日本 |
| 文献子类 | 授权发明 |
| 其他题名 | 保護膜形成用材料 |
| 英文摘要 | PURPOSE:To obtain the title material improved in resistance to a highly concentrated aqueous alkaline solution by mixing a glycidyl compound with a compound having a glycidyl-reactive substituent and a specified compound having a heterocyclic structure. CONSTITUTION:100 pts.wt. compound having at least one glycidyl group in the molecule, desirably a compound of the formula (wherein R, R, R and R are each H or methyl; R, R and R are each H, 1-12C alkyl or an aromatic group; R is phenyl or a pyrrolidone residue; l is 1 or greater; and m, n and k are each 0 or greater) is mixed with 1-100 pts.wt. compound having a glycidyl- reactive substituent [e.g. trimellitic acid (anhydride)], desirably a polyvalent compound, 0.01--1 pt.wt. compound having a heterocyclic structure containing a sec. nitrogen atom and/or a tert. nitrogen atom, desirably an imidazole derivative and optionally a solvent, a surfactant, a silane coupling agent, etc. |
| 公开日期 | 1999-05-24 |
| 申请日期 | 1990-06-20 |
| 状态 | 失效 |
| 内容类型 | 专利 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/34915]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | ジェイエスアール株式会社 |
| 推荐引用方式 GB/T 7714 | 滝西 文貴,東郷 真紀子,遠藤 昌之,等. 保護膜形成用材料. JP2893875B2. 1999-03-05. |
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