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	Apparatus for semiconductor device fabrication diagnosis and prognosis
	MOSLEHI, MEHRDAD M.
	1998-02-17
著作权人	TEXAS INSTRUMENTS INCORPORATED
专利号	US5719495
国家	美国
文献子类	授权发明
其他题名	Apparatus for semiconductor device fabrication diagnosis and prognosis
英文摘要	A sensor (210) for diagnosis and prognosis of semiconductor device fabrication processes measures specular, scattered, and total surface reflectances and transmittances of semiconductor wafers (124). The sensor (210) includes a sensor arm (212) and an opto-electronic control box (214), for directing coherent electromagnetic or optical energy in the direction of semiconductor wafer (124). Opto-electronic control box (214) includes circuitry for measuring the amounts of laser powers coherently reflected from and transmitted through the semiconductor wafer (124) surface and the amounts of electromagnetic powers scatter reflected from and transmitted through the semiconductor wafer (124) surface. Specular, scattered, and total reflectance and transmittance as well as surface roughness values for semiconductor wafer (124) are determined based on measurements of coherent and scatter reflected and transmitted laser powers. The sensor (210) can also provide a go/no-go test of semiconductor fabrication process quality. A process control computer associates with the sensor (210) to respond to spectral reflectance and transmittance measurements yielding surface roughness and thickness measurements as well as diagnosis/prognosis analysis results and control signals.
公开日期	1998-02-17
申请日期	1996-06-05
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/34449]
专题	半导体激光器专利数据库
作者单位	TEXAS INSTRUMENTS INCORPORATED
推荐引用方式 GB/T 7714	MOSLEHI, MEHRDAD M.. Apparatus for semiconductor device fabrication diagnosis and prognosis. US5719495. 1998-02-17.

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