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	Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device
	TANAKA, KOICHIRO
	2008-02-05
著作权人	SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
专利号	US7327916
国家	美国
文献子类	授权发明
其他题名	Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device
英文摘要	The present invention provides a beam homogenizer being equipped with an optical waveguide having a pair of reflection planes provided oppositely, having one end surface into which the laser beam is incident, and having the other end surface from which the laser beam is emitted in the optical system for forming the beam spot. The optical waveguide is a circuit being able to keep radiation light in a certain region and to transmit the radiation light in such a way that the energy flow thereof is guided in parallel with an axis of the channel.
公开日期	2008-02-05
申请日期	2004-03-08
状态	授权
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/33885]
专题	半导体激光器专利数据库
作者单位	SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
推荐引用方式 GB/T 7714	TANAKA, KOICHIRO. Beam Homogenizer, laser irradiation apparatus, and method of manufacturing a semiconductor device. US7327916. 2008-02-05.

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