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Thermal Characterization of Si3N4 Thin Films Using Transient Thermoreflectance Technique
Bai, Suyuan; Tang, Zhenan; Huang, Zhengxing; Yu, Jun
刊名IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS
2009
卷号56页码:3238-3243
关键词Genetic algorithms (GAs) interfacial thermal resistance (ITR) thermal conductivity (TC) transient thermoreflectance technique
ISSN号0278-0046
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5309568
专题大连理工大学
作者单位1.Dalian Univ Technol, Sch Elect & Informat Engn, Dept Elect Engn, Dalian 116024, Peoples R China.,Liaoning Normal Univ, Sch Phys & Elect Technol, Dalian 116029, Peoples R China.
2.Dalian Univ Technol, Inst Microelect, Dalian 116024, Peoples R China.
推荐引用方式
GB/T 7714
Bai, Suyuan,Tang, Zhenan,Huang, Zhengxing,et al. Thermal Characterization of Si3N4 Thin Films Using Transient Thermoreflectance Technique[J]. IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS,2009,56:3238-3243.
APA Bai, Suyuan,Tang, Zhenan,Huang, Zhengxing,&Yu, Jun.(2009).Thermal Characterization of Si3N4 Thin Films Using Transient Thermoreflectance Technique.IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS,56,3238-3243.
MLA Bai, Suyuan,et al."Thermal Characterization of Si3N4 Thin Films Using Transient Thermoreflectance Technique".IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS 56(2009):3238-3243.
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