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	Al-Mg-B thin films prepared by magnetron sputtering
	Wu, Zhanling; Bai, Yizhen; Qu, Wenchao; Wu, Aimin; Zhang, Dong; Zhao, Jijun; Jiang, Xin
刊名	5th Symposium on Vacuum based Science and Technology
	2010
卷号	85页码:541-545
关键词	Al-Mg-B thin films Magnetron sputtering Boron sputtering power Substrate temperature
ISSN号	0042-207X
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5271496
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Elect Beams, Minist Educ, Dalian 116024, Peoples R China. 3.Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Elect Beams, Minist Educ, Dalian 116024, Peoples R China. 4.Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China. 5.Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China. 6.Univ Siegen, Inst Mat Engn, D-57076 Siegen, Germany.
推荐引用方式 GB/T 7714	Wu, Zhanling,Bai, Yizhen,Qu, Wenchao,et al. Al-Mg-B thin films prepared by magnetron sputtering[J]. 5th Symposium on Vacuum based Science and Technology,2010,85:541-545.
APA	Wu, Zhanling.,Bai, Yizhen.,Qu, Wenchao.,Wu, Aimin.,Zhang, Dong.,...&Jiang, Xin.(2010).Al-Mg-B thin films prepared by magnetron sputtering.5th Symposium on Vacuum based Science and Technology,85,541-545.
MLA	Wu, Zhanling,et al."Al-Mg-B thin films prepared by magnetron sputtering".5th Symposium on Vacuum based Science and Technology 85(2010):541-545.

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