| TiN/TiC multilayer films deposited by pulse biased arc ion plating | |
| Zhao, Yanhui; Lin, Guoqiang; Xiao, Jinquan; Dong, Chuang; Wen, Lishi | |
| 刊名 | VACUUM
 |
| 2010 | |
| 卷号 | 85页码:1-4 |
| 关键词 | TIN/TIC multilayer films Pulse biased arc ion plating Microhardness Film/substrate adhesion |
| ISSN号 | 0042-207X |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5267748 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China. 2.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Zhao, Yanhui,Lin, Guoqiang,Xiao, Jinquan,et al. TiN/TiC multilayer films deposited by pulse biased arc ion plating[J]. VACUUM,2010,85:1-4. |
| APA | Zhao, Yanhui,Lin, Guoqiang,Xiao, Jinquan,Dong, Chuang,&Wen, Lishi.(2010).TiN/TiC multilayer films deposited by pulse biased arc ion plating.VACUUM,85,1-4. |
| MLA | Zhao, Yanhui,et al."TiN/TiC multilayer films deposited by pulse biased arc ion plating".VACUUM 85(2010):1-4. |
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