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	Growth and characterization of Ti-doped ZnO films by DC magnetron sputtering
	Liu, Hanfa; Zhang, Huafu; Guo, Meixia; Shi, Xiaofei; Zhou, Aiping
刊名	Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
	2011
卷号	31期号:1页码:95-99
DOI	10.3969/j.issn.1672-7126.2011.01.19
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5249794
专题	山东大学
作者单位	School of Science, Shandong University of Technology, Zibo 255049, China
推荐引用方式 GB/T 7714	Liu, Hanfa,Zhang, Huafu,Guo, Meixia,et al. Growth and characterization of Ti-doped ZnO films by DC magnetron sputtering[J]. Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,2011,31(1):95-99.
APA	Liu, Hanfa,Zhang, Huafu,Guo, Meixia,Shi, Xiaofei,&Zhou, Aiping.(2011).Growth and characterization of Ti-doped ZnO films by DC magnetron sputtering.Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,31(1),95-99.
MLA	Liu, Hanfa,et al."Growth and characterization of Ti-doped ZnO films by DC magnetron sputtering".Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology 31.1(2011):95-99.

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