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Influence of the side-Ohmic contact processing on the polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors
Chongbiao Luan; Zhaojun Lin; Yuanjie Lv; Lingguo Meng; Yingxia Yu; Zhifang Cao; Hong Chen; Zhanguo Wang
刊名Applied physics letters
2012
期号11页码:113501-1-113501-4
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内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5185334
专题山东大学
作者单位1.School of Physics, Shandong University, Jinan 250100, China
2.School of Physics, Shandong University, Jinan 250100, China
3.School o
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GB/T 7714
Chongbiao Luan,Zhaojun Lin,Yuanjie Lv,et al. Influence of the side-Ohmic contact processing on the polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors[J]. Applied physics letters,2012(11):113501-1-113501-4.
APA Chongbiao Luan.,Zhaojun Lin.,Yuanjie Lv.,Lingguo Meng.,Yingxia Yu.,...&Zhanguo Wang.(2012).Influence of the side-Ohmic contact processing on the polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors.Applied physics letters(11),113501-1-113501-4.
MLA Chongbiao Luan,et al."Influence of the side-Ohmic contact processing on the polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors".Applied physics letters .11(2012):113501-1-113501-4.
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