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	Barrier Performance of Various Thick Polycrystalline Ni-Al Films for Integrating PbZr0.4Ti0.6O3 Capacitors on Si
	Guo, Y. N.[1]; Liu, B. T.[2]; Zhao, J. W.[3]; Zhou, Y.[4]; Yan, X. B.[5]; Zhang, X. Y.[6]
刊名	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
	2010
卷号	157期号:6页码:G127-G129
ISSN号	0013-4651
DOI	http://dx.doi.org/10.1149/1.3365060
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5105530
专题	河北大学
作者单位	1.[1]Hebei Univ, Coll Phys Sci & Technol, Tianjin 071002, Hebei, Peoples R China. 2.[2]Hebei Univ, Coll Phys Sci & Technol, Tianjin 071002, Hebei, Peoples R China. 3.[3]Hebei Univ, Coll Phys Sci & Technol, Tianjin 071002, Hebei, Peoples R China. 4.[4]Hebei Univ, Coll Phys Sci & Technol, Tianjin 071002, Hebei, Peoples R China. 5.[5]Hebei Univ, Coll Phys Sci & Technol, Tianjin 071002, Hebei, Peoples R China. 6.[6]Yanshan Univ, State Key Lab Metastable Mat Sci & Technol, Qinhuangdao 066004, Hebei, Peoples R China.
推荐引用方式 GB/T 7714	Guo, Y. N.[1],Liu, B. T.[2],Zhao, J. W.[3],et al. Barrier Performance of Various Thick Polycrystalline Ni-Al Films for Integrating PbZr0.4Ti0.6O3 Capacitors on Si[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2010,157(6):G127-G129.
APA	Guo, Y. N.[1],Liu, B. T.[2],Zhao, J. W.[3],Zhou, Y.[4],Yan, X. B.[5],&Zhang, X. Y.[6].(2010).Barrier Performance of Various Thick Polycrystalline Ni-Al Films for Integrating PbZr0.4Ti0.6O3 Capacitors on Si.JOURNAL OF THE ELECTROCHEMICAL SOCIETY,157(6),G127-G129.
MLA	Guo, Y. N.[1],et al."Barrier Performance of Various Thick Polycrystalline Ni-Al Films for Integrating PbZr0.4Ti0.6O3 Capacitors on Si".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 157.6(2010):G127-G129.

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