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	Annealing and etching treatments on ZnO:Al films deposited by middle frequency sputtering at room temperature
	Zhu, H.[1]; Mai, Y.[2]; Lai, B.[3]; Wan, M.[4]; Huang, Y.[5]; Zhang, L.[6]
刊名	PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
	2014
卷号	211期号:7页码:1589-1595
关键词	annealing morphology optical and electrical properties ZnO:Al film
ISSN号	1862-6300
DOI	http://dx.doi.org/10.1002/pssa.201330653
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5079594
专题	河北大学
作者单位	1.[1]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China. 2.Baoding Tianwei Solarfilms Co Ltd, Baoding 071051, Peoples R China. 3.[2]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China. 4.[3]Baoding Tianwei Solarfilms Co Ltd, Baoding 071051, Peoples R China. 5.[4]Hunan Inst Humanities Sci & Technol, Dept Chem & Mat Sci, Loudi 417000, Peoples R China. 6.[5]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China. 7.[6]Nankai Univ, Tianjin Key Lab Photoelect Thin Film Devices & Te, Tianjin 300071, Peoples R China.
推荐引用方式 GB/T 7714	Zhu, H.[1],Mai, Y.[2],Lai, B.[3],et al. Annealing and etching treatments on ZnO:Al films deposited by middle frequency sputtering at room temperature[J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,2014,211(7):1589-1595.
APA	Zhu, H.[1],Mai, Y.[2],Lai, B.[3],Wan, M.[4],Huang, Y.[5],&Zhang, L.[6].(2014).Annealing and etching treatments on ZnO:Al films deposited by middle frequency sputtering at room temperature.PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,211(7),1589-1595.
MLA	Zhu, H.[1],et al."Annealing and etching treatments on ZnO:Al films deposited by middle frequency sputtering at room temperature".PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 211.7(2014):1589-1595.

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