Fabrication of the slanted electrode matrix on tilting 4.5 (1 1 1) silicon

	Fabrication of the slanted electrode matrix on tilting 4.5 (1 1 1) silicon
	Jia C. ; Dong W. ; Liu C. ; Zhou J. ; Zhang X. ; Sun D. ; Zang H. ; Xuan W. ; Xu B. ; Chen W.
刊名	Optik
	2008
卷号	119 期号:1 页码:23-28
ISSN号	304026
其他题名	论文其他题名
收录类别	EI
公开日期	2012-10-21
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/24497]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Jia C.,Dong W.,Liu C.,et al. Fabrication of the slanted electrode matrix on tilting 4.5 (1 1 1) silicon[J]. Optik,2008,119(1):23-28.
APA	Jia C..,Dong W..,Liu C..,Zhou J..,Zhang X..,...&Chen W..(2008).Fabrication of the slanted electrode matrix on tilting 4.5 (1 1 1) silicon.Optik,119(1),23-28.
MLA	Jia C.,et al."Fabrication of the slanted electrode matrix on tilting 4.5 (1 1 1) silicon".Optik 119.1(2008):23-28.