Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy | |
Yan, Baojun; Liu, Shulin; Heng, Yuekun; Yang, Yuzhen; Yu, Yang; Wen, Kaile | |
2017 | |
卷号 | 12 |
关键词 | Atomic layer deposition X-ray photoelectron spectroscopy Heterojunction Microchannel plate |
ISSN号 | 1556-276X |
DOI | 10.1186/s11671-017-2131-8 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000401723100006 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4978197 |
专题 | 西安理工大学 |
推荐引用方式 GB/T 7714 | Yan, Baojun,Liu, Shulin,Heng, Yuekun,et al. Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy[J],2017,12. |
APA | Yan, Baojun,Liu, Shulin,Heng, Yuekun,Yang, Yuzhen,Yu, Yang,&Wen, Kaile.(2017).Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy.,12. |
MLA | Yan, Baojun,et al."Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy".12(2017). |
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