Microstructure and tribological properties of the a-C:H ﬁlms deposited by magnetron sputtering with CH4 /Ar mixture

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 固体润滑国家重点实验室

	Microstructure and tribological properties of the a-C:H ﬁlms deposited by magnetron sputtering with CH4 /Ar mixture
	Ye YP(冶银平); Li HX(李红轩); Chen JM(陈建敏); Ji L(吉利); Zhou HD(周惠娣)
刊名	Surface and Coatings Technology
	2011
卷号	205 页码:4577-4581
关键词	a-C:H ﬁlm Magnetron sputtering Microstructure Tribological property
ISSN号	0257-8972
通讯作者	冶银平
中文摘要	Hydrogenated amorphous carbon (a-C:H) ﬁlms were deposited on steel and silicon wafers by unbalanced magnetron sputtering under different CH4/Ar ratios. Microstructure and properties of the a-C:H ﬁlms were investigated via Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Atomic force microscopy (AFM) and substrate curvaturemethod. The results revealed that CH4/Ar ratio played an important role in the H content but acted a little function on the sp3 /sp2 ratio of the ﬁlms. Also, the internal stress of those ﬁlms was relatively low(b1 GPa), and the deposition rate decreased ﬁrstly and then increasedwith the decrease of the CH4 fraction. The ﬁlmdeposited under CH4/Ar=1/1 (55 sccm/55 sccm)withmoderate sp3 C–H/sp3 C–Chadthebest tribological properties. The composition, microstructure and properties of the a-C:H ﬁlms were strongly dependent on the deposition process and composition of reactant gases.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502)
语种	英语
公开日期	2012-09-24
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/821]
专题	兰州化学物理研究所_固体润滑国家重点实验室兰州化学物理研究所_先进润滑与防护材料研究发展中心
通讯作者	Ye YP(冶银平)
推荐引用方式 GB/T 7714	Ye YP,Li HX,Chen JM,et al. Microstructure and tribological properties of the a-C:H ﬁlms deposited by magnetron sputtering with CH4 /Ar mixture[J]. Surface and Coatings Technology,2011,205:4577-4581.
APA	冶银平,李红轩,陈建敏,吉利,&周惠娣.(2011).Microstructure and tribological properties of the a-C:H ﬁlms deposited by magnetron sputtering with CH4 /Ar mixture.Surface and Coatings Technology,205,4577-4581.
MLA	冶银平,et al."Microstructure and tribological properties of the a-C:H ﬁlms deposited by magnetron sputtering with CH4 /Ar mixture".Surface and Coatings Technology 205(2011):4577-4581.