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	Electron Temperature and Density of the Plasma Measured by Optical Emission Spectroscopy in VLPPS Conditions
	Zhang, N.; Sun, F.; Zhu, L.; Planche, M. P.; Liao, H.; Dong, C.; Coddet, C.
刊名	JOURNAL OF THERMAL SPRAY TECHNOLOGY
	2011
卷号	20页码:1321-1327
关键词	electron density electron temperature LTE optical emission spectroscopy VLPPS
ISSN号	1059-9630
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4841340
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Key Lab Mat Modificat, Dalian 116085, Peoples R China. 2.LERMPS UTBM, F-90010 Belfort, France. 3.LERMPS UTBM, F-90010 Belfort, France. 4.Dalian Univ Technol, Key Lab Mat Modificat, Dalian 116085, Peoples R China.
推荐引用方式 GB/T 7714	Zhang, N.,Sun, F.,Zhu, L.,et al. Electron Temperature and Density of the Plasma Measured by Optical Emission Spectroscopy in VLPPS Conditions[J]. JOURNAL OF THERMAL SPRAY TECHNOLOGY,2011,20:1321-1327.
APA	Zhang, N..,Sun, F..,Zhu, L..,Planche, M. P..,Liao, H..,...&Coddet, C..(2011).Electron Temperature and Density of the Plasma Measured by Optical Emission Spectroscopy in VLPPS Conditions.JOURNAL OF THERMAL SPRAY TECHNOLOGY,20,1321-1327.
MLA	Zhang, N.,et al."Electron Temperature and Density of the Plasma Measured by Optical Emission Spectroscopy in VLPPS Conditions".JOURNAL OF THERMAL SPRAY TECHNOLOGY 20(2011):1321-1327.

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