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Comparison for the carrier mobility between the III–V nitrides and AlGaAs/GaAs heterostructure field-effect transistors
Luan CB(栾崇彪); Lin ZJ(林兆军); Lv YJ(吕元杰); Feng ZH(冯志红); Zhao JT(赵景涛); Zhou Y(周阳); Yang M(杨铭)
刊名Journal of Semiconductors
2014
期号09页码:69-74
关键词III–V nitride and AlGaAs/GaAs HFETs polarization Coulomb field scattering 2DEG electron mobility
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内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4804211
专题山东大学
作者单位1.School of Physics, Shandong University
2.National Key Labora
推荐引用方式
GB/T 7714
Luan CB,Lin ZJ,Lv YJ,et al. Comparison for the carrier mobility between the III–V nitrides and AlGaAs/GaAs heterostructure field-effect transistors[J]. Journal of Semiconductors,2014(09):69-74.
APA Luan CB.,Lin ZJ.,Lv YJ.,Feng ZH.,Zhao JT.,...&Yang M.(2014).Comparison for the carrier mobility between the III–V nitrides and AlGaAs/GaAs heterostructure field-effect transistors.Journal of Semiconductors(09),69-74.
MLA Luan CB,et al."Comparison for the carrier mobility between the III–V nitrides and AlGaAs/GaAs heterostructure field-effect transistors".Journal of Semiconductors .09(2014):69-74.
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