Improving field-emission properties of SiC nanowires treated by H-2 and N-2 plasma | |
Li, Zhenjiang; Li, Weidong; Wang, Xianlin; Zhang, Meng | |
刊名 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE |
2014 | |
卷号 | 211期号:7页码:1550-1554 |
关键词 | chemical vapor deposition electron microscopy field emission nanostructures SiC |
DOI | 10.1002/pssa.201330422 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4803170 |
专题 | 山东大学 |
作者单位 | 1.Qingdao Univ Sci & Technol, Coll Electromech Engn, Qingdao 266061, Peoples R China. 2.Shandong Univ, State |
推荐引用方式 GB/T 7714 | Li, Zhenjiang,Li, Weidong,Wang, Xianlin,et al. Improving field-emission properties of SiC nanowires treated by H-2 and N-2 plasma[J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,2014,211(7):1550-1554. |
APA | Li, Zhenjiang,Li, Weidong,Wang, Xianlin,&Zhang, Meng.(2014).Improving field-emission properties of SiC nanowires treated by H-2 and N-2 plasma.PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE,211(7),1550-1554. |
MLA | Li, Zhenjiang,et al."Improving field-emission properties of SiC nanowires treated by H-2 and N-2 plasma".PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 211.7(2014):1550-1554. |
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