Characterization of homoepitaxial beta-Ga2O3 films prepared by metal-organic chemical vapor deposition | |
Du, Xuejian; Mi, Wei; Luan, Caina; Li, Zhao; Xia, Changtai; Ma, Jin | |
刊名 | JOURNAL OF CRYSTAL GROWTH
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2014 | |
卷号 | 404页码:75-79 |
关键词 | X-ray diffraction Metal-organic chemical vapor deposition Oxides Semiconducting materials |
DOI | 10.1016/j.jcrysgro.2014.07.011 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4799549 |
专题 | 山东大学 |
作者单位 | 1.Shandong Univ, Sch Phys, Jinan 250100, Peoples R China. 2.Chinese Acad Sci, Sh |
推荐引用方式 GB/T 7714 | Du, Xuejian,Mi, Wei,Luan, Caina,et al. Characterization of homoepitaxial beta-Ga2O3 films prepared by metal-organic chemical vapor deposition[J]. JOURNAL OF CRYSTAL GROWTH,2014,404:75-79. |
APA | Du, Xuejian,Mi, Wei,Luan, Caina,Li, Zhao,Xia, Changtai,&Ma, Jin.(2014).Characterization of homoepitaxial beta-Ga2O3 films prepared by metal-organic chemical vapor deposition.JOURNAL OF CRYSTAL GROWTH,404,75-79. |
MLA | Du, Xuejian,et al."Characterization of homoepitaxial beta-Ga2O3 films prepared by metal-organic chemical vapor deposition".JOURNAL OF CRYSTAL GROWTH 404(2014):75-79. |
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