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	The structures and stability of silylenoids RBrSiLi2 (R=CH3, C(SiH3)(3))
	Qi, Yuhua; Xu, Chongjuan; Geng, Bing; He, Maoxia
刊名	JOURNAL OF MOLECULAR MODELING
	2014
卷号	20期号:11页码:1-7
关键词	Ab initio DFT Insertion reactions Silylenoids Theoretical Study
DOI	10.1007/s00894-014-2462-7
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4797964
专题	山东大学
作者单位	Univ Jinan, Sch Chem & Chem Engn, Key Lab Fluorine Chem & Chem Mat Shandong Prov, Jinan 250022, Peo
推荐引用方式 GB/T 7714	Qi, Yuhua,Xu, Chongjuan,Geng, Bing,et al. The structures and stability of silylenoids RBrSiLi2 (R=CH3, C(SiH3)(3))[J]. JOURNAL OF MOLECULAR MODELING,2014,20(11):1-7.
APA	Qi, Yuhua,Xu, Chongjuan,Geng, Bing,&He, Maoxia.(2014).The structures and stability of silylenoids RBrSiLi2 (R=CH3, C(SiH3)(3)).JOURNAL OF MOLECULAR MODELING,20(11),1-7.
MLA	Qi, Yuhua,et al."The structures and stability of silylenoids RBrSiLi2 (R=CH3, C(SiH3)(3))".JOURNAL OF MOLECULAR MODELING 20.11(2014):1-7.

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