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	The crystallization character of W-Cu thin films at the early stage of deposition
	Tianle Xie; Licai Fu; Baolong Gao; Jiajun Zhu; Wulin Yang; Deyi Li; Lingping Zhou
刊名	Thin Solid Films
	2019
卷号	Vol.690页码:137555
关键词	Tungsten copper Thin films Amorphous Crystallization Early stage of deposition, sputtering
ISSN号	0040-6090
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4748048
专题	湖南大学
作者单位	1.a College of Material Science and Engineering, Hunan University, Changsha 410082, China 2.Key Laboratory of Spray Deposition Technology of Hunan Province, Changsha 410082, China
推荐引用方式 GB/T 7714	Tianle Xie,Licai Fu,Baolong Gao,et al. The crystallization character of W-Cu thin films at the early stage of deposition[J]. Thin Solid Films,2019,Vol.690:137555.
APA	Tianle Xie.,Licai Fu.,Baolong Gao.,Jiajun Zhu.,Wulin Yang.,...&Lingping Zhou.(2019).The crystallization character of W-Cu thin films at the early stage of deposition.Thin Solid Films,Vol.690,137555.
MLA	Tianle Xie,et al."The crystallization character of W-Cu thin films at the early stage of deposition".Thin Solid Films Vol.690(2019):137555.

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