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	Narrowband lamellar multilayer grating with low contrast MoSi/Si materials for the soft x-ray region
	Qiushi Huang; Jiangtao Feng; Tongzhou Li; Xiangmei Wang; Igor V Kozhevnikov; Yang Yang; Runze Qi; Andrey Sokolov; Mewael Giday Sertsu; Franz Schäfers
刊名	Journal of Physics D: Applied Physics
	2019
卷号	Vol.52 No.19页码:195303
ISSN号	0022-3727;1361-6463
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4743839
专题	湖南大学
作者单位	1.Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People’s Republic of China 2.Shubnikov Institute of Crystallography of Federal Scientific Research Centre ‘Crystallography and Photonics’ of the Russian Academy of Sciences, Leninskiy pr. 59, Moscow 119333, Russia 3.Helmholtz-Zentrum Berlin für Materialien und Energie, BESSY-II, Albert-Einstein-Str. 15, 12489 Berlin, Germany 4.Sino-German College of Applied Sciences, Tongji University, 200092, Shanghai, People’s Republic of China
推荐引用方式 GB/T 7714	Qiushi Huang,Jiangtao Feng,Tongzhou Li,et al. Narrowband lamellar multilayer grating with low contrast MoSi/Si materials for the soft x-ray region[J]. Journal of Physics D: Applied Physics,2019,Vol.52 No.19:195303.
APA	Qiushi Huang.,Jiangtao Feng.,Tongzhou Li.,Xiangmei Wang.,Igor V Kozhevnikov.,...&Zhong Zhang and Zhanshan Wang.(2019).Narrowband lamellar multilayer grating with low contrast MoSi/Si materials for the soft x-ray region.Journal of Physics D: Applied Physics,Vol.52 No.19,195303.
MLA	Qiushi Huang,et al."Narrowband lamellar multilayer grating with low contrast MoSi/Si materials for the soft x-ray region".Journal of Physics D: Applied Physics Vol.52 No.19(2019):195303.

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